A photoresist is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronic industry.[1] The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface. In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed. In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas where the mask was not placed. The semiconductors & ICs application segment accounted for the largest share of the global photoresist market in 2017. This segment is expected to continue its dominance during the forecast period. Photoresist is used in the semiconductors industry to imprint the desired circuitry and obtain ICs as the end product. The Asia-Pacific region accounted for the largest share of the global photoresist market in 2017. Taiwan is estimated to account for the largest share of the Asia-Pacific photoresist market in 2017; however, this market in China is anticipated to grow at the highest CAGR during the forecast period. In 2019, the market size of Photoresist is xx million US$ and it will reach xx million US$ in 2025, growing at a CAGR of xx% from 2019; while in China, the market size is valued at xx million US$ and will increase to xx million US$ in 2025, with a CAGR of xx% during forecast period. In this report, 2018 has been considered as the base year and 2019 to 2025 as the forecast period to estimate the market size for Photoresist. This report studies the global market size of Photoresist, especially focuses on the key regions like United States, European Union, China, and other regions (Japan, Korea, India and Southeast Asia). This study presents the Photoresist production, revenue, market share and growth rate for each key company, and also covers the breakdown data (production, consumption, revenue and market share) by regions, type and applications. history breakdown data from 2014 to 2019, and forecast to 2025. For top companies in United States, European Union and China, this report investigates and analyzes the production, value, price, market share and growth rate for the top manufacturers, key data from 2014 to 2019. In global market, the following companies are covered: Tokyo Ohka Kogyo JSR Dowdupont Shin-Etsu Chemical Fujifilm Electronics Sumitomo Chemical Merck Az Electronics Allresist Avantor Performance Materials Microchemicals Toyo Ink Chimei MCC NSCC LG Chemical DNP Daxin Everlight Chemical Market Segment by Product Type ArF immersion ArF dry KrF I-line G-line Market Segment by Application Semiconductors & ICs LCDs Printed circuit boards Others Key Regions split in this report: breakdown data for each region. United States China European Union Rest of World (Japan, Korea, India and Southeast Asia) The study objectives are: To analyze and research the Photoresist status and future forecast in United States, European Union and China, involving sales, value (revenue), growth rate (CAGR), market share, historical and forecast. To present the key Photoresist manufacturers, presenting the sales, revenue, market share, and recent development for key players. To split the breakdown data by regions, type, companies and applications To analyze the global and key regions market potential and advantage, opportunity and challenge, restraints and risks. To identify significant trends, drivers, influence factors in global and regions To analyze competitive developments such as expansions, agreements, new product launches, and acquisitions in the market In this study, the years considered to estimate the market size of Photoresist are as follows: History Year: 2014-2018 Base Year: 2018 Estimated Year: 2019 Forecast Year 2019 to 2025
Table of Contents 1 Report Overview 1.1 Research Scope 1.2 Major Manufacturers Covered in This Report 1.3 Market Segment by Type 1.3.1 Global Photoresist Market Size Growth Rate by Type (2019-2025) 1.3.2 ArF immersion 1.3.3 ArF dry 1.3.4 KrF 1.3.5 I-line 1.3.6 G-line 1.4 Market Segment by Application 1.4.1 Global
