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Global Sputtering Targets Market 2016 Industry Research Report

Notes: Production, means the output of Sputtering Targets Revenue, means the sales value of Sputtering Targets This report studies Sputtering Targets in Global market, especially in North America, Europe, China, Japan, Southeast Asia and India, with production, revenue, consumption, import and export in these regions, from 2011 to 2015, and forecast to 2021. This report focuses on top manufacturers in global market, with production, price, revenue and market share for each manufacturer, covering Honeywell Nikko Materials(JE) Tosoh Praxair(MRC) Sumitomo Chemicals Heraeus ULVAC MITSUI KINZOKU Leybold Optics Mitsubishi Hitachi Metals JX Nippon Mining&Metals KDF KFMI Grikin China New Metal Materials Baoji Oukai Omat JSC POLEMA Plansee Materion ACI Alloys, Inc. Process Materials, Inc. SCI Engineered Materials, Inc. Scotech Limited Sputtering Target Manufacturing Co. Tico Titanium Vacuum Engineering and Materials Co. Able Target Limited Kamis Incorporated By types, the market can be split into Semiconductor associated with target Magnetic recording target Optical recording target Display Targets Other applications target By Application, the market can be split into Flat Panel Displays Optical Discs Automotive & Architectural Glass, WEB Coating Decorative Hard Coatings Solar Cells Optical Communications Magnetic Data Storage Devices Semiconductors Electron Microscopy By Regions, this report covers (we can add the regions/countries as you want) North America China Europe Southeast Asia Japan India
Table of Contents Global Sputtering Targets Market Professional Survey Report 2016 1 Industry Overview of Sputtering Targets 1.1 Definition and Specifications of Sputtering Targets 1.1.1 Definition of Sputtering Targets 1.1.2 Specifications of Sputtering Targets 1.2 Classification of Sputtering Targets 1.2.1 Semiconductor associated with target 1.2
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About this Report
Report ID 22781
Category
  • Chemicals and Materials
Published on 18-Oct
Number of Pages 134
Publisher Name QY Research
Editor Rating
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