Thin film deposition refers to the deposition of specific materials on the substrate to form a thin film, so that it has special properties such as optics and electricity. Thin film deposition equipment can be divided into physical vapor deposition (PVD), chemical vapor deposition (CVD) and atomic layer deposition (ALD) equipment according to different process principles, and can be divided into batch type (tube type) and space type according to different equipment forms (plate type) two technical routes. ALD technology is a special vacuum thin film deposition method with high technical barriers. ALD coating equipment can deposit substances on the surface of the substrate layer by layer in the form of monoatomic layers, and each layer of coating is an atomic layer. According to the characteristics of atoms, the thickness of coating 10 times/layer is about 1nm. Due to the self-limiting surface chemical reaction of ALD technology, it has a number of unique film deposition characteristics: 1. Three-dimensional conformality, widely applicable to substrates of different shapes; Pinhole; 3. Sub-nanometer film thickness control can be realized. Based on the above characteristics, ALD technology is widely applicable to thin film deposition in different scenarios, and has good industrialization prospects in many high-tech fields such as photovoltaics, semiconductors, flexible electronics and other new displays, MEMS, catalysis and optical devices. This report studies ALD thin film deposition equipment. This report studies the global ALD Thin Film Deposition Equipment production, demand, key manufacturers, and key regions. This report is a detailed and comprehensive analysis of the world market for ALD Thin Film Deposition Equipment, and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2022 as the base year. This report explores demand trends and competition, as well as details the characteristics of ALD Thin Film Deposition Equipment that contribute to its increasing demand across many markets. The global ALD Thin Film Deposition Equipment market size is expected to reach $ million by 2029, rising at a market growth of % CAGR during the forecast period (2023-2029). Highlights and key features of the study Global ALD Thin Film Deposition Equipment total production and demand, 2018-2029, (Units) Global ALD Thin Film Deposition Equipment total production value, 2018-2029, (USD Million) Global ALD Thin Film Deposition Equipment production by region & country, production, value, CAGR, 2018-2029, (USD Million) & (Units) Global ALD Thin Film Deposition Equipment consumption by region & country, CAGR, 2018-2029 & (Units) U.S. VS China: ALD Thin Film Deposition Equipment domestic production, consumption, key domestic manufacturers and share Global ALD Thin Film Deposition Equipment production by manufacturer, production, price, value and market share 2018-2023, (USD Million) & (Units) Global ALD Thin Film Deposition Equipment production by Type, production, value, CAGR, 2018-2029, (USD Million) & (Units) Global ALD Thin Film Deposition Equipment production by Application production, value, CAGR, 2018-2029, (USD Million) & (Units) This reports profiles key players in the global ALD Thin Film Deposition Equipment market based on the following parameters ﾖ company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include TEL, ASM, Lam, AMAT, KE, NAURA Technology Group Co., Ltd., Piotech Inc., Advanced Micro-Fabrication Equipment Inc. and Jiangsu Leadmicro Nano Technology Co., Ltd., etc. This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals, COVID-19 and Russia-Ukraine War Influence. Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World ALD Thin Film Deposition Equipment market Detailed Segmentation: Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Units) and average price (K US$/Unit) by manufacturer, by Type, and by Application. Data is given for the years 2018-2029 by year with 2022 as the base year, 2023 as the estimate year, and 2024-2029 as the forecast year. Global ALD Thin Film Deposition Equipment Market, By Region: United States China Europe Japan South Korea ASEAN India Rest of World Global ALD Thin Film Deposition Equipment Market, Segmentation by Type Batch Type (Tube Type) Space Type (Plate Type) Global ALD Thin Film Deposition Equipment Market, Segmentation by Application Photovoltaic Semiconductor Quantum Device Other Companies Profiled: TEL ASM Lam AMAT KE NAURA Technology Group Co., Ltd. Piotech Inc. Advanced Micro-Fabrication Equipment Inc. Jiangsu Leadmicro Nano Technology Co., Ltd. ACM Research(Shanghai),Inc. Beijing E-Town Semiconductor Technology Co., Ltd. Shenzhen S.C New Energy Technology Corporation Wuxi Songyu Technology Company Limited Ideal Deposition Equipment And Applications (Shanghai) Co., Ltd. Nanjing Red Sun Co.,Ltd.(CETC) Picosun Eugenus Veeco Beneq Oxford Instruments Forge Nano Solaytec NCD CN1 Key Questions Answered 1. How big is the global ALD Thin Film Deposition Equipment market? 2. What is the demand of the global ALD Thin Film Deposition Equipment market? 3. What is the year over year growth of the global ALD Thin Film Deposition Equipment market? 4. What is the production and production value of the global ALD Thin Film Deposition Equipment market? 5. Who are the key producers in the global ALD Thin Film Deposition Equipment market? 6. What are the growth factors driving the market demand?
1 Supply Summary 1.1 ALD Thin Film Deposition Equipment Introduction 1.2 World ALD Thin Film Deposition Equipment Supply & Forecast 1.2.1 World ALD Thin Film Deposition Equipment Production Value (2018 & 2022 & 2029) 1.2.2 World ALD Thin Film Deposition Equipment Production (2018-2029) 1.2.3 World ALD Thin Film Deposition Equipment Pricing Trends (2018-2029) 1.3
