Market Analysis and Insights: Global Extreme Ultraviolet Lithography (EUVL) Systems Market The global Extreme Ultraviolet Lithography (EUVL) Systems market was valued at US$ 830.4 in 2020 and will reach US$ 1125.5 million by the end of 2027, growing at a CAGR of 5.2% during 2022-2027. Global Extreme Ultraviolet Lithography (EUVL) Systems Scope and Market Size The global Extreme Ultraviolet Lithography (EUVL) Systems market is segmented by company, region (country), by Type, and by Application. Players, stakeholders, and other participants in the global Extreme Ultraviolet Lithography (EUVL) Systems market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on sales, revenue and forecast by region (country), by Type and by Application for the period 2016-2027. Segment by Type Laser Produced Plasmas Vacuum Sparks Gas Discharges Segment by Application Memory Foundry Others The Extreme Ultraviolet Lithography (EUVL) Systems market is analysed and market size information is provided by regions (countries). Segment by Application, the Extreme Ultraviolet Lithography (EUVL) Systems market is segmented into North America, Europe, China, Japan, Southeast Asia, India and Other Regions. By Company ASML Canon Inc. Intel Corporation Nikon Corporation NuFlare Technology Inc. Samsung Corporation SUSS Microtec AG Taiwan Semiconductor Manufacturing Company Limited (TSMC) Ultratech Inc. Vistec Semiconductor Systems
1 Extreme Ultraviolet Lithography (EUVL) Systems Market Overview 1.1 Extreme Ultraviolet Lithography (EUVL) Systems Product Scope 1.2 Extreme Ultraviolet Lithography (EUVL) Systems Segment by Type 1.2.1 Global Extreme Ultraviolet Lithography (EUVL) Systems Sales by Type (2016 & 2021 & 2027) 1.2.2 Laser Produced Plasmas 1.2.3 Vacuum Sparks 1.2.4 Gas Discharge
